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We demonstrate the DC-Kerr effect in plasma enhanced chemical vapor deposition (PECVD) silicon-rich nitride (SRN) and use it to demonstrate a third order nonlinear susceptibility, , as high as . We employ spectral shift versus applied voltage measurements in a racetrack resonator as a tool to characterize the nonlinear susceptibilities of these films. In doing so, we demonstrate a larger than that of silicon and argue that PECVD SRN can provide a versatile platform for employing optical phase shifters while maintaining a low thermal budget using a deposition technique readily available in CMOS process flows.more » « less
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Nejadriahi, Hani; Friedman, Alex; Sharma, Rajat; Pappert, Steve; Fainman, Yeshaiahu; Yu, Paul (, Optics Express)We demonstrate the thermo-optic properties of silicon-rich silicon nitride (SRN) films deposited using plasma-enhanced chemical vapor deposition (PECVD). Shifts in the spectral response of Mach-Zehnder interferometers (MZIs) as a function of temperature were used to characterize the thermo-optic coefficients of silicon nitride films with varying silicon contents. A clear relation is demonstrated between the silicon content and the exhibited thermo-optic coefficient in silicon nitride films, with the highest achievable coefficient being as high as (1.65±0.08) ×10−4K-1. Furthermore, we realize an SRN multi-mode interferometer (MMI) based thermo-optic switch with over 20 dB extinction ratio and total power consumption for two-port switching of 50 mW.more » « less
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Lin, Hung-Hsi; Vallini, Felipe; Yang, Mu-Han; Sharma, Rajat; Puckett, Matthew W.; Montoya, Sergio; Wurm, Christian D.; Fullerton, Eric E.; Fainman, Yeshaiahu (, Scientific Reports)
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Lin, Hung-Hsi; Sharma, Rajat; Friedman, Alex; Cromey, Benjamin_M; Vallini, Felipe; Puckett, Matthew_W; Kieu, Khanh; Fainman, Yeshaiahu (, APL Photonics)
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Lin, Hung-Hsi; Yang, Mu-Han; Sharma, Rajat; Puckett, Matthew W.; Montoya, Sergio; Wurm, Christian D.; Vallini, Felipe; Fullerton, Eric E.; Fainman, Yeshaiahu (, Applied Physics Letters)
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